INVESTIGATION INTO FINE TECHNOLOGY FOR ION-PLASMA ETCHING OF QUARTZ, LITHIUM TANTALATE, LITHIUM NIOBATE AND LANGASITE

摘要

The work is aimed at finding optimal conditions for manufacturing fine piezoelectric membranes and high-frequency resonators. The mechanism of argon plasma etching of piezoelectric crystals has been studied. For this purpose, the SIMS method has been used with a special ion source (FAB) and an electronic control and output processing system.