Practical Application of In-Line Photometry to Optimize Filtration and Separation Processes

摘要

Recent strides in technology and design of in-line process photometry has created new applications and methods of monitoring and improving the performance of many types of filtration and separation processes. Unlike off-line sampling and analysis, in-line UV, VIS, NIR and Scattered-light photometers provide real time solutions by the in-line measurement of turbidity, color and concentration. This technology offers new information about the process as it happens. When properly applied and utilized, in-line photometry provides increased performance, consistent quality, extended throughput and maximized control of the separation process. The presentation will review the basic principles used in process photometrics and focus on strategies to correctly specify in-line photometry for a spectrum of proven applications used in industrial filtration and separation processes.