首页> 外文会议>IEEE Industry Applications Conference;IAS Annual Meeting >A new punch through IGBT having a new N-buffer layer
【24h】

A new punch through IGBT having a new N-buffer layer

机译:通过IGBT进行新的冲压,具有新的N缓冲层

获取原文
获取外文期刊封面目录资料

摘要

IGBTs based on the NPT (Non Punch Through) design approach exhibit excellent safe operating area and short circuit endurance, a positive temperature coefficient of on-state voltage over the operating current range, and low silicon cost. Thesemerits have supported the development and commercialization of NPT IGBTs above the 1200 Volt class. However, the need for quite thin silicon to obtain competitive on-state losses at 1200 volt and below classes has hindered the use of the NPT approach inthis area. A new Punch Through (PT) IGBT has been developed which exhibits the merits of the NPT approach, rugged SOA and short circuit endurance, while also having a better trade-off relation between on-state voltage and turn-off loss than eitherexisting NPT or third generation PT IGBT.
机译:基于NPT的IGBT(非打孔通过)设计方法表现出优异的安全操作面积和短路耐力,在工作电流范围内的导通电压的正温度系数,以及低硅成本。 凭借在1200伏级上方的NPT IGBTS的开发和商业化支持。 然而,需要相当薄的硅,以在1200伏和低于课程中获得竞争对态的对状态损失已经阻碍了NPT方法Inthis区域的使用。 已经开发了一种新的冲压(PT)IGBT,其展示了NPT方法的优点,粗糙的SOA和短路耐力,同时在导通状态电压和关闭损耗之间具有更好的权衡关系,而不是eThereEnting NPT或 第三代PT IGBT。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号