Theoretical Investigations of the Multitarget Reactive Sputtering Process: Application to the Titanium - Chromium - Oxygen System

摘要

A theoretical development is proposed in order to predict general behaviours of the reactive sputtering process implementing two metallic targets in a reactive atmosphere. From simple physical assumptions, the proposed model is capable of describing some relationships between most parameters in the whole processing region. Therefore, the evolution of the reactive gas partial pressure and sputtering rate from each target with the reactive gas flow rate have been calculated. Theoretical results have been compared with experimental measurements obtained for the titanium - chromium - oxygen system. It is pointed out that the developed model agrees satisfactorily with practical results regarding reactive gas pressure but does not allow to expect the state and the poisoning chronology of each target.