Direct Writing of Metallic Nanostructures by Means of Metal Colloids

摘要

We report on an easy to handle method of fabricating metallic nanostructures by electron-beam lithography (EBL) with surfactant stabilized metal colloids. Colloid films are directly patterned by destroying their organic stabilizers with high energy electron beams. This allows to produce metal nanostructures of various kinds of material and of any geometry without the need for metal deposition- and lift-off-procedures.