Scalable and Consistent Fabrication of Plasmonic colors via Nanoimprint Lithography

摘要

We utilised thermal and UV-assisted Nanoimprint Lithography (NIL) i.e. thermal and UV-assisted to produceplasmonic coloration, and compare their ability for scalable fabrication. Several designs are presented andwe show the generated colors are dependent on their geometry and the direction of polarisation of incidentillumination. Finally, we demonstrated UV-NIL for consistent production of large-area (0.6×0.4 cm~2) plasmoniccolor with extended color gamut.