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Comparison of Different Residual Resistance Calculation Methods used in Predictive Insulator Flashover Models

机译:预测绝缘体闪络模型中使用的不同残留电阻计算方法的比较

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The present paper presents an investigation on the comparison between the numerical and mathematical calculation of the residual resistance of a conductive layer in series with an electrical arc, as described by the Obenaus flashover model. For this purpose, this study has focused on the analytical residual resistance formulation proposed by Wilkins, whose results were compared to numerical calculations performed on a uniform ice-covered post insulator with complete and truncated geometry. The numerical simulation was performed using a previously developed numerical dynamic mono-arc predictive FOV model based on the finite element method. The results obtained showed that the Wilkins formulation underestimates the residual resistance by an average discrepancy of 13% with a maximum value of 34% during the final jump. For the truncated geometry, the residual resistance is overestimated by an average discrepancy of 5% with a maximum value of 8.6% during the final jump. From the AC FOV results, it was found that the use of the complete geometry coupled with the numerical calculation provides the more accurate predictive results with an average discrepancy of 3.9% as compared to the experimental results.
机译:本纸呈现如由Obenaus闪络模型描述上串联电弧的导电层的残留电阻的数值和数学计算之间的比较调查,。为了这个目的,该研究集中于通过威尔金斯,其结果进行比较,以在均匀的冰覆盖的支柱绝缘子具有完整和截短的几何进行数值计算所提出的分析剩余电阻制剂。使用先前开发的数值动态单弧预测FOV基于有限元法模型进行了数值模拟。获得的结果表明,制剂威尔金斯低估由13%与34%的最大值的平均差异最终跳跃期间的剩余电阻。截短的几何形状,剩余电阻是通过与8.6%的最大值的5%的平均差异最终跳跃期间高估。从AC FOV结果,发现相比于实验结果,使用加上数值计算完整的几何形状提供了与3.9%的平均差异的更精确的预测结果。

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