Frequency-measurement-setup for semiconductive layers

摘要

The aim of this work is to measure the parameters of the semiconductive layers over a broad frequency range (300 kHz to 500 MHz). These parameters depend on moisture, temperature and pressure on the semiconductive layers during the measurement. The measuring results are presented as complex permittivity. The focus of the work is to present measuring methodology, sample preparation, calibration and possible sources of errors while determining the parameters. The presented investigations involve new, improved carbon black materials and compounds. The measuring setup enables measurement of the permittivity over a broad frequency range, at different temperatures and pressures as well as at variable moisture rates. The proposed measurement setup is verified by a commercial material measuring device.