首页> 外文会议>Malaysia-Japan International Conference on Nanoscience, Nanotechnology and Nanoengineering >Effect of Various Tin Doping Percentages on the Electrical and Structural Properties of Nanostructured Zinc Oxide Thin Films Deposited using Sol-Gel Immersion Method for Gas Sensing Application
【24h】

Effect of Various Tin Doping Percentages on the Electrical and Structural Properties of Nanostructured Zinc Oxide Thin Films Deposited using Sol-Gel Immersion Method for Gas Sensing Application

机译:各种锡掺杂百分比对溶液浸渍法沉积的纳米结构氧化锌薄膜电气和结构性能的影响

获取原文

摘要

Tin-doped Zinc Oxide (Sn-doped ZnO) thin films were prepared using zinc nitrate hexahydrate as a starting material by sol-gel immersion method. Then the synthesized samples were characterized by current-voltage (I-V) measurement and FESEM. The Sn doping concentration were varied at 0.2 at.%, 0.4 at.%, 0.6 at.%, 0.8 at.% and 1.0 at.%. The result suggests that the optimum value for Sn doping concentration was 0.8 at.% which exhibited the highest conductive sample with value of 3.00×10~(-6) S/cm.
机译:使用溶胶六水合物作为原料制备掺杂氧化锌氧化锌(Sn-掺杂的ZnO)薄膜作为原料,通过溶胶 - 凝胶浸渍法。然后通过电流 - 电压(I-V)测量和FESEM表征合成的样品。 Sn掺杂浓度在0.2℃下变化。%,0.4at%,0.6。%,0.8at%。%和1.0。%。结果表明,Sn掺杂浓度的最佳值为0.8。%,其具有3.00×10〜(-6)S / cm值的最高导电样品。

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号