首页> 外文会议>International Conference on Advanced Manufacturing Technology and Materials Engineering >Influence of Bi_(3.15)Nd_(0.85)Ti_3O_(12) buffer layer on structure and electrical properties of Bi_(0.94)Ce_(0.06)Fe_(0.97)Ti_(0.03)O_3 thin films
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Influence of Bi_(3.15)Nd_(0.85)Ti_3O_(12) buffer layer on structure and electrical properties of Bi_(0.94)Ce_(0.06)Fe_(0.97)Ti_(0.03)O_3 thin films

机译:Bi_(3.15)ND_(0.85)TI_3O_(12)缓冲层对BI_(0.06)CE_(0.06)FE_(0.03)TI_(0.03)O_3薄膜的结构和电性能的影响

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Bi_(0.94)Ce_(0.06)Fe_(0.97)Ti_(0.03)O_3 and Bi_(0.94)Ce_(0.06)Fe_(0.97)Ti_(0.03)O_3/Bi_(3.15)Nd_(0.85)Ti_3O_(12) double-layered thin films were fabricated via sol-gel process on Pt/Ti/SiO_2/Si substrates. The influence of Bi_(3.15)Nd_(0.85)Ti_3O_(12) buffer layer on microstructure and electrical properties of Bi_(0.94)Ce_(0.06)Fe_(0.97)Ti_(0.03)O_3 thin films were investigated in detail. Well-saturated P-E hysteresis loops can be obtained in Bi_(0.94)Ce_(0.06)Fe_(0.97)Ti_(0.03)O_3 films with Bi_(3.15)Nd_(0.85)Ti_3O_(12) buffer. The remnant polarization (2P_r) of the double-layered thin films is 112 μC/cm~2. The coercive field (2E_c) of double-layered films is 672 kV/cm, which is much lower than that of the Bi_(0.94)Ce_(0.06)Fe_(0.97)Ti_(0.03)O_3 thin films. The leakage current density of Bi_(0.94)Ce_(0.06)Fe_(0.97)Ti_(0.03)O_3/Bi_(3.15)Nd_(0.85)Ti_3O_(12) double-layered thin films is 4.12×10~(-5) A/cm~2.
机译:Bi_(0.94)CE_(0.06)FE_(0.03)TI_(0.03)O_3和BI_(0.94)CE_(0.06)FE_(0.03)TI_(0.03)O_3 / BI_(3.15)ND_(0.85)TI_3O_(12)双 通过Pt / Ti / SiO_2 / Si衬底上通过溶胶 - 凝胶工艺制造分层薄膜。 详细研究了Bi_(3.15)Nd_(0.85)Ti_3O_(12)缓冲层对微结构和电气性能的缓冲层(0.06)Fe_(0.03)Ti_(0.03)O_3薄膜的影响。 饱和的P-E滞后环可以在Bi_(0.06)CE_(0.06)FE_(0.03)TI_(0.03)O_3薄膜中获得,具有BI_(3.15)ND_(0.85)TI_3O_(12)缓冲器。 双层薄膜的残余偏振(2P_R)为112μC/ cm〜2。 双层薄膜的矫顽磁场(2E_C)是672kV / cm,远低于Bi_(0.94)Ce_(0.06)Fe_(0.03)Ti_(0.03)O_3薄膜。 Bi_(0.94)CE_(0.06)FE_(0.03)TI_(0.03)O_3 / BI_(3.15)ND_(0.85)TI_3O_(12)双层薄膜是4.12×10〜(-5)a的泄漏电流密度为4.12×10〜(0.85) / cm〜2。

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