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Research of structural and optical properties of MgZnO films annealed at different oxygen partial pressures

机译:不同氧气局部压力退火的MGZNO薄膜结构和光学性质的研究

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Structural and optical properties of MgZnO films were investigated by annealing in oxygen at different pressures. The crystalline quality of the annealed films improves with increasing annealing pressure. After annealing at 3.03×10~5 Pa, the grain size became larger and oxygen content in the annealed films increased. This was attributed to the recrystallization of the films under high annealing pressure. However, a decreased oxygen content was found by annealing the films at 1.01 ×10~5 or 2.05×l0~(-3) Pa. According to the defect levels and the relationship between photoluminescence spectra and annealing conditions, it was suggested that the emission peak located at 2.270 eV in photoluminescence spectra was related to interstitial oxygen (O_i) which will compensate the donor defects (Zn;;or/and Vo) and lead to the MgZnO film transforming into a p-type conduction under the annealing pressure of 3.03 × 10 Pa.
机译:通过在不同压力下在氧中退火来研究MgzNo膜的结构和光学性质。退火薄膜的结晶质量随着退火压力的增加而改善。在3.03×10〜5Pa的退火后,晶粒尺寸变得更大,退火薄膜中的氧含量增加。这归因于在高退火压力下膜的重结晶。然而,通过在1.01×10〜5或2.05×10〜(-3)Pa下的膜来发现氧含量降低。根据光致发光光谱和退火条件之间的关系,建议发射在光致发光光谱中位于2.270eV的峰与间质氧(O_I)有关,其将补偿供体缺陷(Zn ;;或/和Vo),并在3.03的退火压力下导致MgzNo薄膜转化为p型导电×10 pa。

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