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Transformation Nanostructured Nickel Hydroxide to Nickel Oxide Film by Aqueous Chemical Growth

机译:通过化学生长将纳米结构氢氧化镍氧化镍膜转化为氧化镍膜

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Nickel hydroxide, [Ni(OH)_2] has been used extensively as the positive electrode material in rechargeable nickel-based batteries. Several approaches are known to be able for Ni(OH)_2 growth including dc reactive magnetron sputtering, chemical spray pyrolysis, thermal evaporation, etc. This study discusses about nanostructured Ni(OH)_2 film growth by aqueous chemical growth based technique. Ni(OH)_2 film grown at 150 °C has a coral-like morphology whereas converted to NiO film by oxidation of Ni(OH)_2 at 400 °C, confirmed by X-ray diffraction (XRD). Field Emission Scanning Electron Microscopy (FESEM) revealed a coral-like structure of Ni(OH)_2 were grown on the glass substrates. Flake-like morphology was obtained for NiO film. The XRD pattern reveals that the intensity of observed peaks increased with the longer reaction time and film thickness which indicated an improvement in crystallinity. The optical band gap for Ni(OH)_2 film calculated from transmission spectra increased from 3.72 eV to 3.91 eV with the increasing of reaction time. Higher optical band gap of 4.00 eV was obtained for NiO film. This result indicates that the Ni(OH)_2/NiO films grown by aqueous chemical growth could to produce similar quality properties to other conventional methods either nanoparticle or bulk size.
机译:氢氧化镍,[Ni(OH)_2]已被广泛用作可充电镍基电池中的正极材料。已知几种方法能够进行Ni(OH)_2℃的生长,包括DC无反应磁控溅射,化学喷雾热解,热蒸发等。该研究讨论了通过基于水性化学生长的技术进行纳米结构Ni(OH)_2膜生长。在150℃下生长的Ni(OH)_2膜具有珊瑚样形态,而通过氧化Ni(OH)_2在400℃下转化为NiO膜,通过X射线衍射(XRD)证实。场发射扫描电子显微镜(FeSEM)显示在玻璃基板上生长Ni(OH)_2的珊瑚状结构。为NiO膜获得片状形态。 XRD图案显示观察到的峰的强度随着反应时间和薄膜厚度而增加的,表示结晶度的改善。从透射谱计算的Ni(OH)_2膜的光带隙从3.72eV增加到3.91eV,随着反应时间的增加。为NIO薄膜获得4.00eV的更高光带隙。该结果表明,通过含水化学生长生长的Ni(OH)_2 / NiO膜可以产生与纳米颗粒或散装尺寸的其他常规方法类似的质量性质。

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