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A Computational Study on Structures, Stabilities and Electronic Properties of Trifluoromethyl Silsesquioxanes Si2nO3n(CF3)2n (n=1-5)

机译:三氟甲基硅氧烷Si2NO3N(CF3)2N(n = 1-5)的结构,稳定性和电子性质的计算研究(n = 1-5)

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Density functional theory (DFT) calculations were performed to investigate the structures of trifluoromethyl silsesquioxanes Si2nO3n(CF3)2n (n=l-5).Our study focuses on the structures,stabilities,and electronic properties of the trifluornmethyl silsesquioxanes.The large HOMO-LUMO gaps,which range from 5.38 to 8.02 eV,imply optimal electronic structures for these molecules.
机译:进行密度功能理论(DFT)计算以研究三氟甲基倍二烷淀粉Si2NO3N(CF3)2N(N = L-5)的结构.OUR研究重点研究三氟甲基硅氧烷的结构,稳定性和电子性质。大同质LUMO间隙,范围从5.38到8.02 EV,暗示这些分子的最佳电子结构。

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