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Study and fabrication of laser and infrared two-wavebands antireflection film

机译:激光和红外双波带抗反射膜的研究和制造

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According to the requirement of a particular optical instrument, the substrate was sapphire and ZnS and YbF3 were chosen as high index and low index materials respectively, Macleod and TFCalc software were used to design and optimize the film stack, the deposition technology chosen was electron beam vacuum depositing method with the aid of ion assistance. An antireflection coating required with a transmittance at 1064nm wavelength of greater than 97% and the average transmittance over 95% in 3 ∼ 5μm wavebands was achieved in practice. An inner barrier layer (M1) was added to improve the laser induced damage threshold (LIDT) of the AR coatings. The film meets the requirements of the optical instrument.
机译:根据特定光学仪器的要求,将底物是蓝宝石,ZnS和YBF 3 分别被选择为高指数和低指数材料,Macleod和TFcalc软件用于设计和优化胶卷堆叠,选择的沉积技术是借助于离子辅助的电子束真空沉积方法。在实践中,实现了在透射率为大于97%的透射率并且在3〜5μm波段中超过95%的平均透射率所需的抗反射涂层。加入内部阻挡层(M1)以改善Ar涂层的激光诱导的损伤阈值(LIDT)。这部电影符合光学仪器的要求。

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