Photodegrading the Common Odor from Wafer and LCD manufactures by Ag-TiO_2/PunctIonal Filter

摘要

Some of odorous problems from the wafer and LCD manufactures are caused by the volatic organic compounds (VOCs), acetic acid, and Dimethyl sulfide (DMS). VOCs and acetic acid are necessary materials in the manufacturing processes. DMS was transferred from the dimethyl sulfoide, which is one of main compounds in the stripper. These odorous exhausts would persecute residents' health and lower the environmental quality. In this study, Ag-TiO_2/functional filter was utilized for photodegrading these odorous compounds. The functional filter is chosen as K_2CO_3/ACF based on the pervious result, the TiO_2 type, TiO_2 modified by Ag, and the operational parameters are the effect factors on the photodegradation efficiency to discuss.