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Thermal Boundary Resistance in Optoelectronic Devices

机译:光电器件中的热抗辐射电阻

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摘要

A state-of-the-art electro-optical-thermal simulation tool is enhanced to include the effect of phonon reflections at epitaxial interfaces. A detailed numerical investigation of the alteration in electron/hole/phonon scattering rates and heat fluxes due to the thermal boundary resistance at hetero-junctions and epitaxial interfaces is carried out. The heat flux in a 1.3驴m edge-emitting laser and through VCSEL mirrors is considered. An increase in QW temperature within the edge-emitting laser of up to 0.3K is observed.
机译:最先进的电光热模拟工具被增强,包括在外延接口处的声子反射的效果。进行了电子/孔/声子散射速率和热通量由于杂界电阻和外延接口而改变的详细数值研究。考虑了1.3÷M边缘发射激光器和通过VCSEL镜子中的热通量。观察到高达0.3k的边缘发射激光器内的QW温度的增加。

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