Mechanical and tribological characteristics of a-C:H:SiOx films formed by PACVD on titanium alloy VT1-0

摘要

This paper is devoted to the study of the mechanical and tribological properties of a-C:H:SiOx films deposited on a titanium alloy VT1-0 by a plasma chemical deposition method using pulsed bipolar bias voltage.It was shown that after deposition of 2 um-thick a-C:H:SiOx film on a titanium alloy VT1-0 sample,the root-mean-square surface roughness Rq measured using atomic force microscopy decreased from 74 to 50 ran compared to the original substrate.The surface hardness H measured using nanoindentation increased from 3.3 to 12.4 GPa with an almost unchanged elasticity modulus E.As a result,the plasticity index(HIE)of titanium samples increased from 0.03 to 0.11,and the plastic deformation resistance(I-PIE2)increased from 3 to 156 MPa.Deposition of a-C:H:SiOx film on the titanium alloy VT1-0 surface makes possible to reduce the friction coefficient from 0.3-0.6 to 0.1 and the wear rate from 6·10~(-4)to 7·10~(-6)mm~3/Nm.