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Multilayer Design of CrN/MoN Superhard Protective Coatings and Their Characterisation

机译:CRN / Monu Superhard保护涂料的多层设计及其表征

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Multilayer CrN/MoN transition metal nitride coatings were studied in this research. Films were deposited by vacuum arc deposition (Arc-PVD) from Cr and Mo cathodes in nitrogen atmosphere p_N = 0.4 Pa. Three series of samples with different values of negative bias voltage (-20, -150, and -300 V) applied to the surface were fabricated. Each series has samples with 11, 22, 44, 88, 180 and 354 layers while total thickness was maintained with the same value. Samples were studied by scanning electron microscopy (SEM) on cross-sections and coatings surface, energy-dispersive X-ray spectroscopy (EDS), electron backscatter diffraction (EBSD), high-resolution transmission electron microscopy (HRTEM), X-ray diffraction (XRD), micro-indentation. Two main cubic phases of γ-Mo_2N and cubic CrN were detected. It was observed that the crystal growth orientation changes while the negative bias voltage of the substrate decreases. The maximum values of hardness (38-42 GPa) among the studied samples were obtained for coatings with a minimal individual layer thickness of 20 nm deposited at U_b = -20 V.
机译:研究了多层CRN / Mon过渡金属氮化物涂料。从氮气氛中的Cr和Mo阴极的真空弧沉积(arc-pvd)沉积薄膜p_n = 0.4 pa。三系列样品,负偏置电压(-20,-150和-300 v)的不同值施加到表面制造。每个系列具有11,22,44,88,180和354层的样品,而总厚度保持相同的值。通过在横截面和涂层表面上扫描电子显微镜(SEM),能量分散X射线光谱(EDS),电子反向散射衍射(EBSD),高分辨率透射电子显微镜(HRTEM),X射线衍射来研究样品,X射线衍射(XRD),微压痕。检测到γ-MO_2N和立方CRN的两种主要阶段。观察到,晶体生长取向的变化,而基板的负偏压降低。用于在U_B = -20V下沉积20nm的最小单独层厚度的涂层中研究的硬度(38-42GPa)中的最大值(38-42GPa)。

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