Implementing Fourier Ptychography Technique for Periodically-patterned Nanomaterials

摘要

For optical characterization of nanomaterials, a promising non-interferometric phase-retrieval optical characterization technique called Fourier Ptychography has been demonstrated using Hemispherical Digital Condensers, which uses a set of low-resolution real space images to construct a high-resolution, large field-of-view image of the sample under observation, while simultaneously calculating the experimentally unmeasured phase. The goal of this publication is to discuss experimental and computational studies that reveal causes for diffraction-limited performance of Fourier Ptychography in case of periodically-patterned nanomaterials.