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Thermal and optical performance characteristics of a spatial light modulator with high average power picosecond laser exposure applied to materials processing applications

机译:具有高平均功率PICOSECOND激光曝光的空间光调制器的热敏和光学性能特性应用于材料处理应用

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A spatial light modulator (SLM) addressed with Computer Generated Holograms (CGH's) can create structured light fields when an incident laser beam is diffracted by a phase CGH. The power handling limitations of SLMs based on a liquid crystal layer have always been of some concern. Now, with careful engineering of chip thermal management, we present the detailed optical phase and temperature response of a liquid cooled SLM exposed to picosecond laser average powers up to 220W at 1064nm - new knowledge critical for determining device performance at high laser powers. SLM chip temperature rose linearly with incident laser exposure, increasing by only 5°C at 220W incident power, measured with a thermal imaging camera. Thermal response time with continuous exposure was 1-2 seconds. The optical phase response with incident power approaches 2π radians with average powers up to 130W while above this power, liquid crystal thickness variations limit phase response to just over π radians. These remarkable performance characteristics show that liquid crystal based SLM technology is highly robust when efficiently cooled. High speed, multi-beam plasmonic surface micro-structuring at a coverage rate of 8cm~2 s~(-1) is achieved on polished metal surfaces at 25W exposure, while diffractive multi-beam surface ablation on stainless steel at an ablation rate of ~4mm~3 min~(-1) is demonstrated with average power 100W. Continuous exposure for many hours exceeding 100W laser power did not result in any detectable drop in diffraction efficiency hence no permanent changes in SLM phase response characteristics have been observed This research work will help to accelerate the use of liquid crystal SLMs for both scientific and ultra-high throughput laser-materials micro-structuring applications.
机译:通过计算机生成的全息图(CGH的)寻址的空间光调制器(SLM)可以在通过相位CGH衍射时产生结构的光场。基于液晶层的SLM的功率处理限制一直是一些问题。现在,通过仔细的芯片热管理工程,我们介绍了液体冷却SLM的详细光学相位和温度响应,暴露于PICOSECOND激光平均功率,高达220W的1064MM,新知识对于在高激光功率下确定器件性能至关重要。 SLM芯片温度与入射激光曝光线性升起,仅在220W入射功率下增加5°C,用热成像相机测量。连续曝光的热响应时间为1-2秒。具有入射电力的光学阶段响应接近2π弧度,平均功率高达130W,虽然高于该功率,液晶厚度变化限制了刚刚π弧度的相位响应。这些显着的性能特征表明,在有效冷却时,基于液晶的SLM技术是高度稳健的。在25W曝光的抛光金属表面上实现了高速,多束等级表面微结构,以8cm〜2 s〜(-1)的覆盖率,而在抛光金属表面上达到抛光金属表面,而在不锈钢上以烧蚀速度的衍射多束表面消融〜4mm〜3分钟〜(-1),平均功率100W。连续曝光超过100W激光功率的不断导致衍射效率的任何可检测的下降,因此已经观察到SLM相位响应特性的永久性变化已经观察到这项研究工作将有助于加速使用液晶SLMS的科学和超级高通量激光材料微结构化应用。

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