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Design of a Fabry-Perot Interferometer Based on Silicon Wafer for Dielectric Gas Sensing Applications

机译:基于硅晶片的法布里 - 珀罗干涉仪设计介电气传感应用

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In this work a design and analysis of a Fabry-Perot interferometer (FPI) based on a silicon wafer for possible application in a SF6 gas sensor used in electric power systems is presented. The sensor design is based on cross correlation spectroscopy principle with an FPI, which acts an optical modulator. Hence, due to characteristics of the FPI transmission spectrum, it can be used detect molecules with very well defined ro-vibrational lines such as those produced by diatomic and linear molecules. The design of the FPI depends mainly of the SF6 absorption wavelength peaks and of the optimum thickness of the silicon wafer. For this reason, in order to measure this absorption peaks a HITRAN database was used. The optimum thickness of the silicon wafer was calculated and simulated transmission spectrum. Finally, we demonstrated by using analytical simulations that a silicon wafer can be implemented as a FPI and used in a SF6 gas sensor.
机译:在这作用中,提出了基于用于电力系统中使用的SF6气体传感器中可能应用的基于硅晶片的法布里 - 珀罗干涉仪(FPI)的设计和分析。传感器设计基于具有FPI的交叉相关光谱原理,其作用光学调制器。因此,由于FPI透射谱的特性,可以使用具有非常明确的RO振动线的分子来使用诸如由硅藻和线性分子产生的分子。 FPI的设计主要取决于SF6吸收波长峰值和硅晶片的最佳厚度。因此,为了测量这种吸收峰值,使用HITRAN数据库。计算硅晶片的最佳厚度和模拟透射光谱。最后,我们通过使用分析模拟来证明硅晶片可以实现为FPI并且在SF6气体传感器中使用。

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