首页> 外文会议>Conference on photonic and phononic properties of engineered nanostructures VII >Fabrication and optimization of ITO-Ag co-sputtered nanocomposite films as plasmonic materials in the near-infrared region
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Fabrication and optimization of ITO-Ag co-sputtered nanocomposite films as plasmonic materials in the near-infrared region

机译:ITO-Ag共溅射纳米复合膜在近红外区域中的等离子体材料制备和优化

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摘要

Systematic study of magnetron sputtered silver-indium tin oxide (Ag-ITO) composite films has been carried out by altering the atomic ratio of silver in the co-sputtered films. The optimal micro-structure characteristic with smooth surface and tight junction between silver and ITO particles could be obtained by tuning Ag atomic ratio. Spectroscopic ellipsometry is applied in order to evaluate the plasmonic properties. Real and imaginary permittivity of the films are retrieved utilizing Drude-Lorentz dispersion model. The cross-over wavelength of the films, optimized to as low as around 1130 nm, exhibits high adjustability on the ratio of silver material and RTP process. Much lower imaginary permittivity as well as tunable real permittivity suggest the potentiality of Ag-ITO composite films as substituted plasmonic materials in the near-infrared region.
机译:通过在共溅射膜中改变银的原子比来进行磁控溅射银氧化铟锡(AG-ITO)复合膜的系统研究。通过调节Ag原子比可以获得银和ITO颗粒之间的光滑表面和紧密结合的最佳微结构特性。施加光谱椭圆形,以评估等离子体性能。利用Drude-Lorentz分散模型检索薄膜的真实和虚数介电常数。优化到大约1130nm的膜的交叉波长,对银材料和RTP工艺的比率具有高可调节性。虚长的虚介电常数以及可调实际介电常数表明AG-ITO复合膜在近红外区域中作为取代的等离子体材料的潜力。

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