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Electrochemical Investigation of Thiourea as Corrosion Inhibitor for Copper in Acidic Solution

机译:硫脲作为酸性溶液铜腐蚀剂的电化学研究

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The thiourea as a copper corrosion inhibitor in the base electrolyte (containing 0.54M H_2SO_4 and 0.88M CuSO_4) was investigated using electrochemical impedance spectroscopy (EIS) and potentiodynamic polarization. The research results suggest that the inhibition efficiency depends on the concentration of the thiourea. The slopes of the cathodic and anodic Tafel lines are approximately constant and independent on the inhibitor concentration. Potentiodynamic polarization curves showed that thiourea acts as the mixed-up inhibitor. The results obtained from EIS measurements are in good agreement with that obtained from potentiodynamic polarization.
机译:使用电化学阻抗谱(EIS)和电位辐射极化研究了基础电解质中的铜腐蚀抑制剂(含有0.54M H_2SO_4和0.88M CUSO_4)。研究结果表明,抑制效率取决于硫脲的浓度。阴极和阳极Tafel系的斜率近似恒定并与抑制剂浓度无关。电位动力学偏振曲线显示硫脲作为混合抑制剂。从EIS测量获得的结果与从电位态极化获得的良好一致。

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