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Ab initio study on the CO oxidation on Zn-doped graphene

机译:AB Initio研究Zn掺杂石墨烯的CO氧化研究

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The oxidation of CO molecules on Zn-doped graphene has been investigated by using the first principles calculations. Eley-Rideal (ER) oxidation mechanism is considered, where the energy barrier for the rate limiting step (OOCO → CO_2+O) is only 0.42 eV, much lower than that of noble metals. Hirshfeld charge analysis shows that the doped Zn atom would modify the charge distributions of adsorbed O_2 and CO molecules. The charge transfer between the Zn-doped graphene and adsorbed molecules plays an important role for the CO oxidation. Our result shows that Zn-doped graphene is an efficient catalyst for CO oxidation at room
机译:通过使用第一个原理计算研究了Zn掺杂石墨烯上的CO分子氧化。考虑Eley-rideal(ER)氧化机理,其中速率限制步骤(Ooco→Co_2 + O)的能量屏障仅为0.42eV,远低于贵金属。 Hirshfeld电荷分析表明,掺杂的Zn原子将改变吸附的O_2和CO分子的电荷分布。 Zn掺杂石墨烯和吸附分子之间的电荷转移起到共同氧化的重要作用。我们的结果表明,Zn掺杂的石墨烯是在房间里的共同氧化的有效催化剂

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