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Temperature Dependence of Electron Impact Ionization Coefficient in Bulk Silicon

机译:电子碰撞电离系数在散装硅中的温度依赖性

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This work exhibits a modified procedure to compute the electron impact ionization coefficient of silicon for temperatures between 77 and 800K and electric fields ranging from 70 to 400 kV/cm. The ionization coefficients are computed from the electron momentum distribution function through solving the Boltzmann transport equation (BTE). The arrangement is acquired by joining Legendre polynomial extension with BTE. The resulting BTE is solved by differences-differential method using MATLAB?. Six (X) equivalent ellipsoidal and non-parabolic valleys of the conduction band of silicon are taken into account. Concerning the scattering mechanisms, the interval acoustic scattering, non-polar optical scattering and II scattering are taken into consideration. This investigation showed that the ionization coefficients decrease with increasing temperature. The overall results are in good agreement with previous experimental and theoretical reported data predominantly at high electric fields.
机译:该工作表现出修改的过程,用于计算硅的电子碰撞电离系数,用于77至800K和电场范围为70至400kV / cm的温度。 通过求解Boltzmann传输方程(BTE),从电子动量分布函数计算电离系数。 通过用BTE加入Legendre多项式扩展来获取该布置。 通过MATLAB的差异差分方法解决了所得BTE? 考虑硅导带的六(x)等同的椭圆形和非抛物面谷。 关于散射机构,考虑间隔声散射,非极性光散射和II散射。 该研究表明,电离系数随温度的增加而降低。 整体结果与先前的实验和理论报告的数据吻合良好,主要在高电场。

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