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Low-Temperature Crack-Free Si_3N_4 Nonlinear Photonic Circuits for CMOS-Compatible Optoelectronic Cointegration

机译:用于CMOS兼容光电协整的低温易裂解SI_3N_4非线性光子电路

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In this communication, authors report for the first time on the fabrication and testing of Si_3N_4 non-linear photonic circuits for CMOS-compatible monolithic co-integration with silicon-based optoelectronics. In particular, a novel process has been developed to fabricate low-loss crack-free Si_3N_4 750-nm-thick films for Kerr-based nonlinear functions featuring full thermal budget compatibility with existing Silicon photonics and front-end Si optoelectronics. Briefly, differently from previous and state-of-the-art works, our nonlinear nitride-based platform has been realized without resorting to commonly-used high-temperature annealing (~1200°C) of the film and its silica uppercladding used to break N-H bonds otherwise causing absorption in the C-band and destroying its nonlinear functionality. Furthermore, no complex and fabrication-intolerant Damascene process - as recently reported earlier this year - aimed at controlling cracks generated in thick tensile-strained Si_3N_4 films has been used as well. Instead, a tailored Si_3N_4 multiple-step film deposition in 200-mm LPCVD-based reactor and subsequent low-temperature (400°C) PECVD oxide encapsulation have been used to fabricate the nonlinear microresonant circuits aiming at generating optical frequency combs via optical parametric oscillators (OPOs), thus allowing the monolithic cointegration of such nonlinear functions on existing CMOS-compatible optoelectronics, for both active and passive components such as, for instance, silicon modulators and wavelength (de-)multiplexers. Experimental evidence based on wafer-level statistics show nitride-based 112-um-radius ring resonators using such low-temperature crack-free nitride film exhibiting quality factors exceeding Q >3 x 10~5, thus paving the way to low-threshold power-efficient Kerr-based comb sources and dissipative temporal solitons in the C-band featuring full thermal processing compatibility with Si photonic integrated circuits (Si-PICs).
机译:在这次沟通中,作者首次报告了与基于硅基光电子的CMOS兼容的单片共同集成的Si_3N_4非线性光子电路的制造和测试。特别地,已经开发了一种新的方法来制造用于基于Kerr的非线性函数的低损耗易裂的Si_3N_4 750-NM厚膜,其具有与现有的硅光子和前端Si光电子的全热预算兼容性。简而言之,与先前和最先进的工程不同,我们的非线性氮化物的平台已经实现,而不诉诸薄膜的常用高温退火(〜1200°C)及其用于破裂的二氧化硅覆盖物NH键在C波段中引起吸收并破坏其非线性功能。此外,没有复杂和制造 - 不宽容的镶嵌过程 - 近期今年早些时候报告的 - 目前还在使用厚度拉伸Si_3N_4薄膜中控制产生的裂缝。相反,已经使用了200-mm LPCVD基反应器中的定制的Si_3N_4多步膜沉积和随后的低温(400℃)PECVD氧化物封装来制造旨在通过光学参数振荡器产生光学频率梳理的非线性微流体电路(OPOS),从而允许在现有的CMOS兼容光电子上单一的单片协整,用于有源和无源部件,例如硅调制器和波长(DE-)多路复用器。基于晶圆级统计的实验证据显示使用这种低温裂缝的氮化物膜的基于氮化物的112-um半径环谐振器,其具有超过Q> 3×10〜5的质量因子,从而铺平了低阈值功率的方式 - 基于Kerr的基于次拍摄的梳子源和C波段的耗散时间孤子,具有与Si光子集成电路(SI-PIC)的全热处理兼容性。

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