The comparative analysis of particles and films, and the conditions of their formation from arc-discharge plasma and at the CTF devices

摘要

The paper presents the comparison of the structures and physical properties of films and dust particles. They are prepared on the vacuum chamber walls from the arc-discharge plasma and tokamak plasma. The morphology of the surface, microstructure, color range, grain-size distribution, and elemental and phase composition of films and micro particles have been compared. It was found that the films and powders have properties of nanocrystal materials. The structure, surface morphology and some properties of the arc-discharge plasma particles are similar to the structures and properties of the particles deposited on the TOKAMAK walls.