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Parameterized source term in the diffusion approximation for enhanced near-field modeling of collimated light

机译:增强近场建模的扩散近似参数化源期限

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Most analytical methods for describing light propagation in turbid medium exhibit low effectiveness in the near-field of a collimated source. Motivated by the Charge Simulation Method in electromagnetic theory as well as the established discrete source based modeling, we have reported on an improved explicit model, referred to as "Virtual Source" (VS) diffuse approximation (DA), to inherit the mathematical simplicity of the DA while considerably extend its validity in modeling the near-field photon migration in low-albedo medium. In this model, the collimated light in the standard DA is analogously approximated as multiple isotropic point sources (VS) distributed along the incident direction. For performance enhancement, a fitting procedure between the calculated and realistic reflectances is adopted in the near-field to optimize the VS parameters (intensities and locations). To be practically applicable, an explicit 2VS-DA model is established based on close-form derivations of the VS parameters for the typical ranges of the optical parameters. The proposed VS-DA model is validated by comparing with the Monte Carlo simulations, and further introduced in the image reconstruction of the Laminar Optical Tomography system.
机译:用于描述浊度介质中光传播的大多数分析方法在准直源的近场中表现出低的有效性。通过电磁理论中的电荷仿真方法以及建立的离散源模型,我们报告了改进的显式模型,称为“虚拟源”(VS)漫反射近似(DA),以继承数学简单DA虽然大大扩展了其在利用低级介质中近场光子迁移的有效性。在该模型中,标准DA中的准直光类似地近似为沿着入射方向分布的多个各向同性点源(Vs)。对于性能增强,近场采用计算和现实反射之间的拟合程序,以优化VS参数(强度和位置)。为了实际应用,基于光学参数的典型范围的VS参数的闭合形式推导来建立显式2VS-DA模型。通过与Monte Carlo模拟进行比较,验证所提出的VS-DA模型,并进一步引入层光学断层扫描系统的图像重建中。

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