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Preparation and characterization of NiO photocathodes sensitized with PbS quantum dots

机译:用PBS量子点致敏的Nio光致疗法的制备与表征

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The nanosized tremella-like NiO was synthesized by a simple hydrothermal method at low temperature. A novelty modified (CH_3)_4N)_2S/((CH_3)_4N)_2S_n electrolyte was introduced in solar cell successfully and NiS as the counter electrode. Moreover, PbS sensitized p-type NiO was synthesized by chemical bath deposition (CBD) in an precursor solution to ensure the nanosized tremella-like NiO films obtain a better uniformity and high penetration. At the same time, a series of comparative experiments were designed for studying the influence of mesoporous NiO film thickness on the photoelectron characteristic of the cells. The result indicated that when there were three layers of screen printing and the thickness of NiO film was approximately 3μm, the maximum power conversion efficiency of 0.87% was achieved, with 512 mV of V_(oc), 0.33% of ff and 5.14 mA cm~(-2) of J_(sc).
机译:通过在低温下通过简单的水热法合成纳米型颤相的NiO。成功地在太阳能电池中引入了一种新颖的改性(CH_3)_4N)_2S /((CH_3)_4N)_2S_N电解质,并作为对电极的NIS。此外,PBS敏化的p型NiO通过化学浴沉积(CBD)在前体溶液中合成,以确保纳米型电颤状的NiO膜获得更好的均匀性和高渗透。同时,设计了一系列比较实验,用于研究中孔NiO膜厚度对细胞光电子特性的影响。结果表明,当存在三层丝网印刷时,NiO膜的厚度约为3μm时,实现了0.87%的最大功率转换效率,512mV V_(OC),0.33%的FF和5.14 mA cm 〜(-2)j_(sc)。

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