An Insightful Review of Galvanic Formations and Dynamic Interactions in Selectively Corroding Silicon Surfaces during Wafer Manufacturing

摘要

This insightful review summarizes a number of unique electrochemical features in selectively corroding silicon surfaces and their significant impacts on interfacial quality and dielectric reliability. These insights are critical to quickly identify and solve the hidden or intricate galvanic occurrences in highly dynamic and variable environments of wafer manufacturing.