首页> 外文会议>PRiME Joint International Meeting of the Electrochemical Society, the Electrochemical Society of Japan, and the Korean Electrochemical Society >Engineering Large In-Plane Tensile Strains in Ge Microdisks, Microrings and Racetrack Optical Cavities
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Engineering Large In-Plane Tensile Strains in Ge Microdisks, Microrings and Racetrack Optical Cavities

机译:在GE微小探针,磁头和跑道光学腔中工程大型在线拉伸菌株

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Highly strained Ge micro-cavities are demonstrated, with biaxial equivalent tensile strains > 2% at the top surface, demonstrating photoluminescence up to the detector cut-off of 2.5 μm wavelength. Ge on Si micro-disk, rings, and racetrack structures are investigated, which have been undercut by wet etching techniques. The anisotropy of the wet etch in the Si leads to the realization of novel, partially suspended structures. The strain distributions in the different cavity structures are discussed and compared with regard to the in-plane uniformity, peak strain level, and effect of the strain distribution on the Ge band-structure.
机译:对高度应变的GE微腔进行说明,在顶表面上具有双轴等效拉伸菌株> 2%,将光致发光达到2.5μm波长的检测器切断。研究了GE在SI微磁盘,环和赛道结构上,通过湿法蚀刻技术被削减。 Si中湿法蚀刻的各向异性导致了新颖,部分悬浮结构的实现。讨论了不同腔结构中的应变分布,并与面内均匀性,峰值应变水平和应变分布对电气带结构的影响进行比较。

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