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The Choice of Substrate Material and Electrodeposition of High Purity Niobium Coatings

机译:基材材料的选择和高纯度铌涂层的电沉积

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The interaction of different materials with the niobium containing melt was investigated. As substrate materials the ceramics, beryllium and carbopyroceram were chosen. Several spherical ceramic and beryllium samples were coated with protective molybdenum film by magnetron sputtering. After the experiment (exposition time 10 min) the exfoliation of molybdenum film from ceramic samples was observed due to interaction of the substrate with the melt. The beryllium samples regardless of the shape and the presence of the protective films were dissolved in the niobium containing melt due to more negative electrode potential comparing with niobium one. The carbopyroceram samples were exposed in the melt during 3 and 12 hours. It was found that the carbopyroceram it not corrodes in the niobium containing melt. The optimal regimes for electrodeposition of smooth uniform niobium coatings with the thickness up to 50 μm on carbopyroceram spheres were found.
机译:研究了不同材料与含铌熔体的相互作用。作为衬底材料,选择陶瓷,铍和碳粉酰胺。通过磁控溅射用保护钼膜涂覆几个球形陶瓷和铍样品。实验后(曝光时间10分钟)由于基材与熔体的相互作用,观察到来自陶瓷样品的钼膜的剥离。由于与铌液相比,由于更负电极电位,铍样品溶解在含铌熔体中的形状和保护膜的存在。在3和12小时内暴露在熔体中的氨基甲磺酰胺样品。发现氨基甲磺脲类在含铌的熔体中没有腐蚀。发现,发现厚度高达50μm的光滑均匀铌涂层电沉积的最佳制度。

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