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Thin Films based on Tungsten Carbide with Binary, Ternary and Quaternary Composition, Obtained by Magnetron Sputtering

机译:基于碳化钨,三元和四元组成的薄膜通过磁控溅射获得

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摘要

Tungsten carbide is an anorganic compound with very interesting tribology features such as: the highest melting point and hardness values among the known compounds, high elasticity (Young) modulus, high thermal stability on a large temperature range, low chemical reactivity, etc. Magnetron sputtering is the most convenient deposition method for obtaining tribological coatings with binary/ternary/quaternary composition starting from WC commercially magnetron sputtering targets. Roughness and grain size of such coatings were investigated by Atomic Force Microscopy and electrical sheet resistance was investigated by using the Four Point Probe Method with ALESSI head and W electrodes.
机译:碳化钨是一种具有非常有趣的族化合物的无机化合物,如:已知化合物的最高熔点和硬度值,高弹性(杨)模量,高温范围内的高热稳定性,低化学反应性等磁控溅射是从WC商业磁控溅射靶开始的具有二元/三元/四元组合物获得摩擦学涂层的最方便的沉积方法。通过用原子力显微镜研究这种涂层的粗糙度和晶粒尺寸,并通过使用alessi头和W电极使用四点探针方法来研究电薄层电阻。

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