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A new approach for calculating the band gap of semiconductors within the density functional method

机译:一种计算密度函数方法中半导体带隙的新方法

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Within the framework of the density functional theory, the method was developed to calculate the band gap of semiconductors. We have evaluated the band gap for a number of monoatomic and diatomic semiconductors (Sn, Ge, Si, SiC, GaN, C, BN, AlN). The method gives the band gap of almost experimental accuracy. An important point is the fact that the developed method can be used to calculate both localized states (energy deep levels of defects in crystal), and electronic properties of nanostructures.
机译:在密度函数理论的框架内,开发了该方法以计算半导体的带隙。我们已经评估了许多单原子和硅藻半导体(Sn,Ge,Si,SiC,GaN,C,Bn,AlN)的频段缺口。该方法具有几乎实验准确性的带隙。一个重要的一点是,开发方法可用于计算局部状态(晶体中的缺陷水平),以及纳米结构的电子性质。

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