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Influence of CeO_2-Doping on the Electrical Properties of ZnO-Bi_2O_3-Based Varistor Ceramics

机译:CEO_2掺杂对基于ZnO-Bi_2O_3压敏电阻陶瓷的电气性能的影响

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The microstructure and electrical properties of CeO_2-doped ZnO-Bi_2O_3-based varistors were investigated for different amounts of the dopant. The phase composition of CeO_2-doped samples was similar to the undoped samples. Ce mainly segregated at the grain boundaries within the EDS detection limit. The average grain size decreased from 7.3 to 6.7 μm and the breakdown voltage increased from 438 to 501 V/mm when the content of CeO_2 ranged from 0 to 0.2 mol%. The nonlinear coefficient increased from 38 to 51 when the content of CeO_2 increased from 0 to 0.1 mol%., but the further doping caused it to decrease up to 44 at 0.2mol%. The leakage current decreased from 1 to 0.4 uA/cm2 when the content of CeO_2 ranged from 0 to 0.1 mol%. Then it increased to 0.7 μA/cm~2 at 0.2 mol%. The density of interface states, the barrier height and the donor concentration increased when the content of CeO_2 ranged from 0 to 0.1 mol%, but decreased at 0.2 mol%. Hence, when the content ranges from 0 to 0.1 mol%, CeO_2 acts as a donor and can improve the electrical properties.
机译:研究了CEO_2掺杂的ZnO-Bi_2O_3的压敏电阻的微观结构和电性能,用于不同量的掺杂剂。 CEO_2掺杂样品的相组成类似于未掺杂的样品。 CE主要在EDS检测极限内的晶界分离。当CEO_2的含量为0至0.2mol%时,平均晶粒尺寸从7.3到6.7μm降低,击穿电压从438增加到501 v / mm。当CEO_2的含量增加到0至0.1摩尔%时,非线性系数从38升至51增加,但是进一步的掺杂使其在0.2mol%下降低至44。当CEO_2的含量范围为0至0.1mol%时,泄漏电流从1到0.4 uA / cm 2降低。然后它在0.2mol%下增加至0.7μA/ cm〜2。当CEO_2的含量范围为0至0.1mol%时,界面状态的密度,屏障高度和供体浓度增加,但在0.2mol%下降低。因此,当含量范围为0至0.1mol%时,CeO_2用作供体,可以改善电性能。

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