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Characterization of Ta-B-C nanostructured hard coatings

机译:TA-B-C纳米结构硬涂层的表征

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Microstructure and mechanical properties of Ta-B-C nanocrystalline layers prepared by magnetron sputtering were studied. DC magnetron sputtering was used to prepare thin layers,on rotated substrates. Various deposition parameters were tested. Microstructure of layers was studied by means of scanning and transmission electron microscopy on thin lamellar cross sections prepared using a focussed ion beam. Both undisturbed layers and the volume under relatively large indentation prints (load of 1 N) were observed. The microstructure observations were correlated with mechanical properties characterized by means of nanoindentation experiments in both the static and the dynamic loading regime. Elastic modulus, indentation hardness and fracture resistance of prepared nanostructured coatings were evaluated and discussed.
机译:研究了磁控溅射制备的TA-B-C纳米晶层的微观结构和力学性能。 DC磁控溅射用于在旋转基板上制备薄层。测试各种沉积参数。通过使用聚焦离子束制备的薄层横截面上的扫描和透射电子显微镜研究了层的微观结构。观察到不受干扰的层和相对大的压痕印刷(载荷为1n)的体积。微观结构观察与机械性能相关,其特征在于静态和动态加载制度的纳米凸缘实验。评估并讨论制备纳米结构涂层的弹性模量,压痕硬度和断裂性。

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