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An Exposure Model for Supersingular Isogeny Diffie-Hellman Key Exchange

机译:超晶体源性地狱Hellman密钥交换的曝光模型

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In this work, we present an exposure model for the isogeny computation in the quantum-resistant supersingular isogeny Diffie-Hellman (SIDH) key exchange protocol. Notably, we propose this exposure model to characterize the severity of new attacks that force an SIDH user to divulge certain intermediate values. In our model, we show how an attacker can break SIDH by discovering an intermediate kernel point and its corresponding curve. To strengthen an SIDH-user against the exposure of intermediate values, we propose a random curve isomorphism that is performed just before the large-degree isogeny. We show that this countermeasure is computationally inexpensive compared to the whole of SIDH and can still operate with the Kirkwood et al. validation model that allows a static-key user to ensure the first round of the other party was performed honestly. The goal of this paper is to present an additional protection against future attacks for implementations of SIDH.
机译:在这项工作中,我们为量子抗性的超晶Isogey Diffie-Hellman(SIDH)关键交换协议中的Isogeny计算曝光模型。值得注意的是,我们提出了这种曝光模型,以表征强制SIDH用户泄露某些中间值的新攻击的严重性。在我们的模型中,我们通过发现中间内核点及其相应的曲线来展示攻击者如何打破SIDH。为了加强对中间值的暴露的恐惧用户,我们提出了一种随机曲线同构,该同构在大程度上是在大程度上进行的。我们表明,与整个SIDH相比,这一对策是廉价的,并且仍然可以与Kirkwood等人一起运作。验证模型,允许静态密钥用户确保诚实地执行第一轮另一方。本文的目标是额外保护防止赛季实施的未来攻击。

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