Fabrication of plasmonic thin films and their characterization by optical method and FDTD simulation technique

摘要

In this paper we present optical properties of thin metal films deposited on the glass substrates by the physical vapor deposition. Localized surface plasmon polaritons of different film thicknesses have been spectrally characterized by optical methods. Evidence of the Au nanoparticles in deposited thin films have been demonstrated by Scanning Electron Microscope (SEM) and Atomic Force Microscope (AFM) and their dimensions as well as separations have been evaluated. As a first approximation, the simulation model of deposited nanoparticles without assuming their dimension and separation distributions has been created. Simulation model defines relation between the nanoparticle dimensions and their separations. Model of deposited nanoparticles has been simulated by the Finite-Difference Time-Domain (FDTD) simulation method. The pulsed excitation has been used and transmission of optical radiation has been calculated from the spectral response by Fast Fourier Transform (FFT) analyses. Plasmonic extinctions have been calculated from measured spectral characteristics as well as simulated characteristics and compared with each other. The nanoparticle dimensions and separations have been evaluated from the agreement between the simulation and experimental spectral characteristics. Surface morphology of thin metal film has been used as an input for the detail simulation study based on the experimental observation of metal nanoparticle distribution. Hence, this simulation method includes appropriate coupling effects between nanoparticles and provides more reliable results. Obtained results are helpful for further deep understanding of thin metal films plasmonic properties and simulation method is demonstrated as a powerful tool for the deposition technology optimizations.