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Dialkyldiselenophosphinato-metal complexes - a new class of single source precursors for deposition of metal selenide thin films and nanoparticles

机译:Dialkyldiselenophosinato-Metal络合物 - 一种用于沉积金属硒化型薄膜和纳米粒子的新类别源前体

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We report here a new synthetic approach for convenient and high yield synthesis of dialkyldiselenophosphinato-metal complexes. A number of diphenyldiselenophosphinato-metal as well as diisopropyldiselenophosphinato-metal complexes have been synthesized and used as precursors for deposition of semiconductor thin films and nanoparticles. Cubic Cu_(2-x)Se and tetragonal CuInSe_2 thin films have been deposited by AACVD at 400, 450 and 500°C whereas cubic PbSe and tetragonal CZTSe thin films have been deposited through doctor blade method followed by annealing. SEM investigations revealed significant differences in morphology of the films deposited at different temperatures. Preparation of Cu_(2-x)Se and In_2Se_3 nanoparticles using diisopropyldiselenophosphinato-metal precursors has been carried out by colloidal method in HDA/TOP system. Cu_(2-x)Se nanoparticles (grown at 250°C) and In_2Se_3 nanoparticles (grown at 270°C) have a mean diameter of 5.0 ± 1.2 nm and 13 ± 2.5 nm, respectively.
机译:我们在此报道了一种新的合成方法,用于方便和高产量合成二烷基磷酸盐 - 金属配合物。已经合成了许多二苯基二烯磷磷酸盐以及二异丙二烯烃磷酸盐络合物,并用作沉积半导体薄膜和纳米颗粒的前体。立方Cu_(2-x)Se和四方Cuinse_2薄膜通过400,450和500℃的AACVD沉积,而立方PBSE和四边形CZTSE薄膜已经通过刮刀方法沉积,然后进行退火。 SEM调查揭示了在不同温度下沉积的薄膜形态的显着差异。通过HDA /顶部系统中的胶体方法进行Cu_(2-X)Se和In_2Se_3纳米粒子的制备已经通过胶体方法进行。 Cu_(2-x)Se纳米颗粒(在250℃下生长)和In_2Se_3纳米颗粒(在270℃下生长)分别为5.0±1.2nm和13±2.5nm的平均直径。

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