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MORPHOLOGICAL IMPACT ON THERMAL INTERFACE RESISTANCE OF SELF CATALYZING FECRALLOY MWNT TIMS

机译:自催化粉体MWNT矩阵热界面电阻的形态学影响

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Self catalyzing Fecralloy substrates are investigated as a growth substrate for Multi-walled Carbon Nanotubes (MWNT) Thermal Interface Materials (TIMs). Fecralloy is used without any additional catalyst and with minimal surface preparation to grow double-sided MWNT TIM assemblies. The growth behavior is studied by way of the array morphologies, i.e. array height, density, crystallinity, and diameter distribution. The effects of growth temperature and time are used to observe the growth kinetics, showing a bimodal growth rate with temperature and an optimal growth rate at 725°C with a noticeable onset of amorphous carbon at higher temperatures. The contact resistance of dozens of such samples are evaluated using a DC, 1D reference bar, thermal conductivity measurement system. Temperature and pressure dependent measurements offer insight into the interfacial phonon conduction physics and elastic deformation mechanics of the CNTs tips respectively. Due to the challenges associated with deliberately controlling a single array morphology, a multivariate, statistical approach is used to observe the trends of contact resistance. The contact resistance shows the strongest correlation with array height, following a R ~= L~(-0.5), which contradicts Fourier's law. However, this is likely a result of the mechanical compliance rather than a ballistic conduction mechanism. Finally, several attempts were made at modeling the relationship between the measured array morphologies and the contact resistance. However, the modeling is relatively unsuccessful, forcing one to rely on the empirical relations found in the exploratory data analysis.
机译:研究了自催化阳极合金基材作为多壁碳纳米管(MWNT)热界面材料(TIMS)的生长底物。使用较少的催化剂和最小的表面制剂来使用阳果而没有额外的催化剂,以生长双面MWNT TIM组件。通过阵列形态学,即阵列高度,密度,结晶度和直径分布来研究生长行为。生长温度和时间的影响被用于观察生长动力学,显示出随温度的双峰生长速度和在较高的温度在725℃的最佳生长速率与无定形碳的明显的发作。使用DC,1D参考棒,导热率测量系统评估数十个这样的样品的接触电阻。温度和压力依赖性测量分别对CNT尖端的界面声子传导物理和弹性变形力学进行了深入了解。由于与故意控制单个阵列形态相关的挑战,使用多变量,统计方法来观察接触电阻的趋势。接触电阻显示与阵列高度的最强相关性,遵循R〜= L〜(-0.5),这与傅里叶的法律相矛盾。然而,这可能是机械顺应性而不是弹道传导机制的结果。最后,在模拟测量的阵列形态和接触电阻之间的关系时进行了几次尝试。然而,建模相对不成功,强迫一个依赖于探索性数据分析中发现的经验关系。

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