PVD preparation process of (TiN + CrN)/CrAlN superhard nanocomposite multilayer coatings

摘要

In this study, multi-source multi-target evaporation-sputtering PVD technology to prepare (TiN + CrN)/CrAlN nanocomposite multilayers, accurate modulation of the composition and structure of the coating can effectively reduce the stress in the coating in order to achieve (TiN + CrN)/CrAlN nano-composite multilayer dielectric films optimized design, to reach a good overall performance. (TiN + CrN)/CrAlN superhard nanocomposite multilayer coatings on the surface of tools and molds with carbide and high-speed tool steel materials, followed by the TiN film; (TiN + CrN) film, in the TiN relative content in the layer accounted for 55-65%, CrN relative content for 35-45%; gradient (Cr_xAl_(1-x)) N-film, x = 0-0.5; structure of TiN/(TiN + CrN)/CrAlN superhardnano-composite multi-layer coating.