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Photoelectro degradation of rhodamine B on Co-doped TiO_2 films under visible light

机译:可见光下罗丹明B对罗丹明B薄膜的光电劣化

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In a single photoreactor, the degradation of rhodamine B (RhB) was studied on TiO_2 and Co-doped TiO_2 (Co-TiO_2) films under visible light. The results show that the degradation rate of RhB by photocatalytic (PC) and photosensitization (PS) on Co-TiO_2 films is quicker than that by PS degradation on TiO_2 film. However, a fast N-de-ethylation leads to the increase in degradation rate unsatisfactory. When a bias potential was applied onto Co-TiO_2 films, the degradation rate of RhB greatly increased. This can be attributed to the generation of more hydroxyl radicals on Co-TiO_2 anodes and cathode. These OH-radicals attack the chromophoric structure of RhB. In addition, with the bias potential application, the optimal Co~(2+) dopant concentration increases from 0.02% to 0.4%.
机译:在单个光反应器中,在可见光下对TiO_2和共掺杂的TiO_2(CO-TiO_2)膜进行罗丹明B(RHB)的降解。结果表明,光催化(PC)和光敏化(PS)对CO-TiO_2膜的光敏(PS)的降解速率比TiO_2膜上的PS降解更快。然而,快速的N-溶解导致降解速率的增加不令人满意。当将偏置电位施加到Co-TiO_2膜上时,RHB的降解速率大大增加。这可以归因于在CO-TiO_2阳极和阴极上产生更多的羟基自由基。这些OH-自由基攻击RHB的发色结构。另外,通过偏置电位应用,最佳CO〜(2+)掺杂剂浓度从0.02%增加到0.4%。

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