Seebeck Coefficient of Nanolayer Growth of Anatase TiO_(2-x)/Al-foil by Atomic Layer Deposition

摘要

Non-stoichiometric and impurity doped titanium dioxide materials are good candidates for use in high temperature thermoelectric devices. Nanolayers of non-stoichiometric (TiO_(2-x)) thin films were deposited on Al-foil by atomic layer deposition growth method. X-ray diffraction experiments showed anatase phase for these nanolayers. This crystal structure was maintained even after an annealing treatment of 600 °C for 60 minutes under an O2 pressure of ～10 psi. This investigation presents for the first time how Al-foil can be flinctionalized by manipulating the Seebeck coefficient of these TiO_(2-x) nanolayers.