Design and Experimental Study of Deposition Temperature Control System in Ultra-High Vacuum

摘要

Deposition temperature is a key factor influencing the growth morphology of thin-films, aiming at this phenomenon, a precise control system of deposition temperature in ultra-high vacuum is developed in the paper. It can realize accurate temperature control in a range of 150K to 450K during experiment by combination of resistance heating up and liquid helium cooling down strategies, which is benefit to further understand the temperature-depended mechanism of organic molecule thin-film growth. Besides, it is experimentally studied that the growth morphology of p-6p molecules on a mica substrate is closely related to the substrate deposition temperature, indicating that the length of p-6p nano-fibers is proportional to the deposition temperature, while their distribution density is inversely proportional to the temperature.