Magneto-elastic and Mechanical Properties of Fe_(81-x)Ni_xGa_(19)/Si(100) and Fe_(81-y)Ni_yGa_(19)/glass Films

摘要

Two series of Fe_(81-x)Ni_xGa_(19)/Si(100) and Fe_(81-y)Ni_yGa_(19)/glass films, where x or y = 0 – 26at.%Ni, were made by the magnetron sputtering method. We have performed three kinds of experiments on these films: [i] the saturation magnetostriction (λ_S); [ii] the nano-indentation; and [iii] magnetic hysteresis-loop measurements. The main findings of this study are summarized below:[A] λ_S reachesa local maximum, when x = 22 and [B]the Young's modulus, E_f, of the Fe-Ni-Ga film deposited on a Si(100) substrate is larger than that (the same film) deposited on a glass substrate. We conclude thatthe Fe_(59)Ni_(22)Ga_(19) film could beemployed in a low-field and low-costnano-magnetic switching device.