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Visible ITO Pattern in Capacitive Touch Lens: Cause and Countermeasure

机译:可见电容式触控镜头的ITO图案:原因与对策

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Market demand for touch panel/lens has been exceptionally high for the recent years due to smartphones, tablet PCs, etc. Among the available technologies to envision touch functionality, capacitive touch screen has received the great attention due to the various superiorities over the competing ones. Capacitive touch screen features two transparent conductive electrodes, such as ITO (indium tin oxide). However, the difference in refractive indices of ITO, substrate, and air, ITO pattern is clearly visible if there is no proper countermeasure. Most of touch screen makers and ITO substrate supplier utilize "index-matching technology" to prevent this phenomenon. Even though of the attempts to minimize visible ITO pattern in final product, there are many technical and process challenges. In this study, the causes around visible ITO pattern were investigated to understand and provide the proper countermeasures. One of the possible causes for visible ITO pattern was improper annealing process in ITO especially for film substrate. According to XPS (X-ray photoelectron spectroscopy)/ESCA (electron spectroscopy for chemical analysis) and other analysis results, ITO, which is normally deposited through sputtering, is not fully transformed to oxidized state. After aligning and adjusting annealing condition, acknowledged visible ITO pattern was disappeared. Other causes for visible patterns were also discussed in detail, and the relevant countermeasures were provided.
机译:由于智能手机,平板电脑等,近年来,触摸面板/镜头的市场需求在智能手机,平板电脑等。在设想触摸功能中的可用技术中,电容式触摸屏由于竞争对手的各种优越性而受到极大的关注。电容式触摸屏具有两个透明导电电极,例如ITO(氧化铟锡)。然而,如果没有适当的对策,ITO,衬底和空气的折射率,ITO模式的差异清晰可见。大多数触摸屏制造商和ITO基板供应商利用“指数匹配技术”来防止这种现象。即使尝试在最终产品中最小化可见的ITO模式,也有许多技术和过程挑战。在这项研究中,调查了可见ITO模式的原因,以了解并提供适当的对策。可见ITO图案的可能原因之一是ITO的不正常的退火过程,尤其是薄膜基材。根据XPS(X射线光电子能谱)/ ESCA(用于化学分析的电子光谱)和其他分析结果,通常通过溅射沉积的ITO不完全转化为氧化状态。在对齐和调整退火条件后,已确认的可见ITO模式消失。还详细讨论了可见模式的其他原因,提供了相关的对策。

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