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Near-field to far-field transformation based on stratton-chu fomula for EMC measurements

机译:基于STRATTON-CHU公式的EMC测量近场转换近场

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This paper deals with the near-field to far-field transformation for electromagnetic compatibility (EMC) testing. Since the conventional EMC testing has an inefficient measurement process, Stratton-Chu formula is used to predict the far-field emission by a simple and direct process. The near-filed of a microstrip patch antenna is extracted at regular interval from the focused plane, and the far-field is generated from the near-field by Stratton-Chu formula. Through the three-dimensional electromagnetic (EM) field simulation, calculated far-field results of the patch antenna from Stratton-Chu formula computation are proven to be available. In comparison with full-wave analysis, outcomes of computed far-field have error less than 3.1%.
机译:本文对电磁兼容性(EMC)测试的近场转换涉及远场转换。由于传统的EMC测试具有低效的测量过程,因此使用STRATTON-CHU公式来通过简单直接的过程预测远场发射。微带贴片天线的近摄提取通过聚焦平面定期提取,并且远场由Stratton-Chu公式从近场产生。通过三维电磁(EM)场仿真,已证明从Stratton-Chu公式计算计算的贴片天线的远场结果可获得。与全波分析相比,计算远场的结果具有小于3.1%的误差。

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