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Analysis of microroughness evolution in X-ray astronomical multilayer mirrors by surface topography with the MPES program and by X-ray scattering

机译:使用MPES程序通过表面形貌和X射线散射分析X射线天文多层镜中的微粗糙度演变

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Future hard X-ray telescopes (e.g. SIMBOL-X and Constellation-X) will make use of hard X-ray optics with multilayer coatings, with angular resolutions comparable to the achieved ones in the soft X-rays. One of the crucial points in X-ray optics, indeed, is multilayer interfacial microroughness that causes effective area reduction and X-Ray Scattering (XRS). The latter, in particular, is responsible for image quality degradation. Interfacial smoothness deterioration in multilayer deposition processes is commonly observed as a result of substrate profile replication and intrinsic random deposition noise. For this reason, roughness growth should be carefully investigated by surface topographic analysis, X-ray reflectivity and XRS measurements. It is convenient to express the roughness evolution in terms of interface Power Spectral Densities (PSD), that are directly related to XRS and, in turn, in affecting the optic HEW (Half Energy Width). In order to interpret roughness amplification and to help us to predict the imaging performance of hard X-ray optics, we have implemented a well known kinetic continuum equation model in a IDL language program (MPES, Multilayer PSDs Evolution Simulator), allowing us the determination of characteristic growth parameters in multilayer coatings. In this paper we present some results from analysis we performed on several samples coated with hard X-ray multilayers (W/Si, Pt/C, Mo/Si) using different deposition techniques. We show also the XRS predictions resulting from the obtained modelizations, in comparison to the experimental XRS measurements performed at the energy of 8.05 keV.
机译:未来的硬X射线望远镜(例如SIMBOL-X和Constellation-X)将使用具有多层涂层的硬X射线光学器件,其角分辨率可与软X射线中获得的分辨率相媲美。实际上,X射线光学器件的关键点之一是多层界面微粗糙度,它会导致有效的面积减小和X射线散射(XRS)。后者尤其是导致图像质量下降的原因。通常会由于基板轮廓复制和固有的随机沉积噪声而导致多层沉积过程中界面光滑度下降。因此,应通过表面形貌分析,X射线反射率和XRS测量仔细研究粗糙度的增长。用与XRS直接相关的界面功率谱密度(PSD)来表示粗糙度的变化是很方便的,PSD与XRS直接相关,进而影响光学HEW(半能量宽度)。为了解释粗糙度放大并帮助我们预测硬X射线光学器件的成像性能,我们在IDL语言程序(MPES,多层PSDs进化模拟器)中实现了众所周知的动力学连续方程模型,从而使我们能够确定多层涂料的特征性生长参数在本文中,我们介绍了使用不同的沉积技术对涂有硬质X射线多层膜(W / Si,Pt / C,Mo / Si)的多个样品进行的分析得出的一些结果。与在8.05 keV能量下进行的实验XRS测量相比,我们还显示了从获得的建模结果得出的XRS预测。

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