首页> 外文会议>Annual Conference of the Australasian Corrosion Association >CORROSION STUDIES ON SURFACE TREATED TIALN AND ALCRN COATINGS IN 3.5 NACL
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CORROSION STUDIES ON SURFACE TREATED TIALN AND ALCRN COATINGS IN 3.5 NACL

机译:3.5%NaCl中表面处理TiAln和Alcrn涂层的腐蚀研究

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In recent years,developments in the use of thin hard coatings for cutting tool and metal forming applications have focused on multi-component alternatives to traditional TiN coatings,such as TiCN,TiAIN,CrN,AlCrN and AlCrON.These coatings are becoming established in many engineering applications where enhanced wear resistance and reduced friction is required.Typical method for deposition of these coatings on an industrial scale are by various physical vapour deposition(PVD)technologies,particularly cathodic arc evaporation,electron beam evaporation and magnetron sputtering and consequently,a feature common to all these techniques is the generation of coating defects,such as voids,pin-holes and macro-particles which can result in reduced corrosion resistance,when subject to corrosive environments.Consequently,there is a need to develop techniques for modifying the surface morphology to produce dense,defect-free coatings,thus improving the corrosion resistance.Post deposition treatments,such as various blasting brushing and polishing techniques,commonly used for de-burring,polishing and genera! cleaning,have shown to improve the surface texture of PVD coatings,which can influence the resultant corrosion behaviour of the coatings.However,these studies have been limited to TiN coatings.In the current study,a series of post deposition treatments,to include drag polishing(DP),wet and dry blasting(WB and DB respectively)and nylon abrasive filament(NAF)brushing and were employed on TiAIN and AlCrN coatings deposited on 1020 carbon steel substrates using cathodic arc evaporation PVD process.Electrochemical corrosion studies were conducted in saline(3.5% NaCl)solutions using potentiodynamic scanning.Ecorr and Icorr values were determined using Tafel Extrapolation.M orphological characterization of the surface of the coatings was conducted using optical and SEM imaging,prior to and after corrosion testing,to determine mechanisms of corrosion.The results of this study showed a slight improvement in the corrosion resistance for the surface treated TiAIN and AlCrN coatings.Corrosion resistance was limited by the presence of defects such as pin holes,voids and macro-particles which controlled the corrosion behaviour of the coating system at lower anodic potentials,while at higher potentials,corrosion behaviour was controlled by the development of large pitted regions,coating spallation and significant underlying substrate attack.In general,improved corrosion resistance was observed for the gentler,lower impact surface treatments,such as wet blasting(WB)compared with the higher impact treatments,such as dry blasting(DB),which are more likely to increase the amount of defects which could act as corrosion initiation sites.
机译:近年来,用于切削工具和金属成形应用的薄硬涂层的开发集中于传统锡涂层的多组分替代品,例如TiCN,Tiain,CrN,Alcrn和Alcron。这些涂层在许多方面成为建立需要增强耐磨性和减少摩擦力的工程应用。用于在工业规模上沉积这些涂层的典型方法是通过各种物理气相沉积(PVD)技术,特别是阴极电弧蒸发,电子束蒸发和磁控溅射,因此所有这些技术的常见是产生涂层缺陷,例如空隙,销孔和宏观颗粒,这可能导致腐蚀性降低,当受腐蚀性环境受到腐蚀性环境时,需要开发用于改变表面的技术生产致密,无缺陷涂层的形态,从而提高耐腐蚀性。沉积处理,S uch作为各种爆破和抛光技术,常用于脱毛,抛光和永久!清洁,已经显示出改善PVD涂层的表面纹理,这会影响涂层的所得腐蚀行为。然而,这些研究仅限于锡涂料。目前的研究,一系列后沉积处理,包括阻力抛光(DP),湿和干爆炸(分别)和尼龙磨料长丝(NAF)刷涂,并在使用阴极电弧蒸发PVD过程上沉积在1020碳钢基材上的Tiain和Alcrn涂层上使用。在电化学腐蚀研究中进行了电化学腐蚀研究使用电位动力学扫描的盐水(3.5%NaCl)溶液。使用Tafel外推确定Excr和Icorl值,在腐蚀测试之前和之后使用光学和SEM成像进行涂层表面的孤孤立的孤片性表征,以确定腐蚀机制。该研究的结果表明,表面处理的Tiain和Alcrn涂料的耐腐蚀性略有提高。腐蚀性Resi由于诸如销孔,空隙和宏观颗粒的缺陷存在的缺陷存在的姿势受到限制,该铅孔和宏观颗粒控制涂层系统在较低的阳极电位下,而在较高的电位下,通过大型凹坑区域的开发,腐蚀行为控制介绍和显着的底层底物攻击。一般来说,与更高的冲击处理(如干爆炸(DB))相比,观察到更改善的温釜(WB),例如湿爆破(WB),例如干爆炸(DB),这些剥离性均有底层底物攻击均有较大的耐腐蚀性。增加可以充当腐蚀启动位点的缺陷量。

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