Laser-induced front side and back side etching of fused silica with KrF and XeF excimer lasers using metallic absorber layers: A comparison

摘要

Laser-induced front side and back side etching is a method for nanometer-precision laser etching of transparent materials by using thin absorber layers. For fluences up to 5 J/cm2, the chromium metal layer-induced back side and front side etching results in equal surface morphologies and etching depths at certain parameters.